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    nanoscience and nanotechnology: small is different
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Facilities

Multipurpose ultra-high-vacumm (UHV) facility for in-situ growth and characterization with four interconnected chambers:

Pulsed Laser Deposition of growth of 2D, metallic, insulating and semiconducting materials. It is equipped with i) manipulator with both resistive and laser-heating options reaching up to 1400 ºC at low/high ramp rate; ii) target carousel stage with 5 positions; iii) fast entry for both target and samples; iv) Quantell NdYAG laser with 10Hz and fundamental, 2w and 4w harmonics.

MBE Growth Chamber: Equipped with a manipulator with cooling (LN) and annealing (1200ºC) facilities, and a quartz microbalance implemented in the sample holder. Divided in two stages: one upper stage to grow organic films (3-cell Kentax evaporator for organic materials); this stage is equipped with RGA analyzer and gas dosing facilities that allows CVD graphene growth. The lower stage is equipped with different e-beam and resistive evaporators (a 3-cell Omicron, 4-pocket SPECS, and 3 home-made evaporators) to grow inorganic films.

Magnetron Sputtering Chamber: Manipulator with a heating sample holder (500ºC) and a quartz microbalance implemented in the sample holder. It has 5 DC magnetrons for metals and 1 RF magnetron for oxides. It is interconnected to the MBE chamber through a valve and a parking stage.

Analysis Chamber: It allows the in situ characterization of thin films growth in the previous chambers with the following techniques:

X-Ray Photoemission Spectroscopy (XPS) with a monochromated Al K source.

Ultraviolet Photoemission Spectroscopy (UPS) with He I, HeII and Ne lines.

Charge compensator (flood gun) to measure insulating materials.

Low Energy Electron Diffraction (LEED), 3 grids system.

Cleaning facilities (Ar+ sputter gun), annealing (800ºC) and cooling (LN) manipulator

Reactor chamber: In this chamber is possible to dose reactive gases at high doses (maximum pressure of 10-5 mbar), and perform Thermal Desorption Spectroscopy (TDS). Atomic cracker system for H2 and N2.

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 The Advanced Magneto-Optics Lab is devoted to the study of magneto-transport properties of thin films and multilayers. It is equipped with

  • home-made magnetometer setups based on the vectorial magneto-optic Kerr effect (vMOKE) capable of simultaneously perform magnetoresistive (MR), variable temperature (VT) in a wide temperature range (15-500K), and time-resolved Kerr magnetometry/imaging (tr-vMOKE) measurements, in longitudinal/transversal/polar geometries.
  • 2 x vectorial Kerr microscopes (EVICO, home-made) allowing for imaging of magnetic domains and simultaneous magneto-transport experiments;
  • set ups enabling magneto-transport and harmonic experiments up to 2T at RT and 9T in 4He-flow cryostat down to 1.7K;
  • Keithley 6221 and 2420
  • 2 x SR830 lock-in amplifiers
  • Oscilloscopes Tektronics DPO3034 and MSO24 series
  • Waveform generator MP750511

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The Spin-Transport setups are devoted to the study of magneto-transport properties of thin films and multilayers capable of combined harmonics, dc and Kerr experiments, with field up to 8T and temperature down to 1.8K.

The different setups are equipped with

  • 2 x Keithley 6221 Current Source + fA
  • 2 x SR830 lock-in amplifiers
  • 2 x Keitlhley 2420 Nanovoltmeter
  • Oscilloscopes Tektronics DPO3034 and MSO24 series
  • Waveform generator MP750511
  • Water cooled electromagnet with adjustable pole-pole distance up to 1T
  • Computing station equipped with NVIDIA-Titan for micromagnetic simulations.
  • PPMS Nanomagnetics with 8T superconducting magnet, double rotator stage for in-plane and out-of-plane measurements, in 1.8K-300K temperature range.

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